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Number of items: 3.

Article

Oven, Robert, Ashworth, D.G., Al-Rawi, S. (1988) Impurity redistribution during sublimation in UHV. Solid-State Electronics, 31 (11). pp. 1650-1652. ISSN 0038-1101. (doi:10.1016/0038-1101(88)90015-9) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:38926)

Bowyer, M.D.J., Ashworth, D.G., Oven, Robert (1992) Representation of ion implantation projected range profiles by Pearson distribution curves for silicon technology. Solid-State Electronics, 35 (8). pp. 1151-1166. ISSN 0038-1101. (doi:10.1016/0038-1101(92)90016-6) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:53084)

Bowyer, M.D.J., Ashworth, D.G., Oven, Robert (1996) Representation of two-dimensional ion implantation rest distributions by Pearson distribution curves for silicon technology. Solid-State Electronics, 39 (1). pp. 119-126. ISSN 0038-1101. (doi:10.1016/0038-1101(95)00117-C) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:18840)

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