Bowyer, M.D.J., Ashworth, D.G., Oven, Robert (1992) Representation of ion implantation projected range profiles by Pearson distribution curves for silicon technology. Solid-State Electronics, 35 (8). pp. 1151-1166. ISSN 0038-1101. (doi:10.1016/0038-1101(92)90016-6) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:53084)
The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided. | |
Official URL: http://dx.doi.org/10.1016/0038-1101(92)90016-6 |
Abstract
In this paper a transport equation (TE) is derived that matches closely (within the limitation of an infinite target) the transport model in the Monte Carlo code TRIM. Initially, the authors derive a TE that incorporates an arbitrary free-flight path length distribution function and a stopping energy. From this TE a coupled set of integral equations (for spatial moments up to order four) incorporating the liquid free-flight path model used in TRIM is derived. Also, for the gas-like model of the free-flight path length distribution, the equivalence is shown between the new TE and the LSS backward linearized Boltzmann equation extended by Brice to include an intermediate energy.
Item Type: | Article |
---|---|
DOI/Identification number: | 10.1016/0038-1101(92)90016-6 |
Subjects: | T Technology |
Divisions: | Divisions > Division of Computing, Engineering and Mathematical Sciences > School of Engineering and Digital Arts |
Depositing User: | Tina Thompson |
Date Deposited: | 10 Dec 2015 16:15 UTC |
Last Modified: | 05 Nov 2024 10:39 UTC |
Resource URI: | https://kar.kent.ac.uk/id/eprint/53084 (The current URI for this page, for reference purposes) |
- Export to:
- RefWorks
- EPrints3 XML
- BibTeX
- CSV
- Depositors only (login required):