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Arnold, Donna C. and O'Callaghan, J.M. and Sexton, A. and Tobin, J.M. and Amenitsch, H. and Holmes, J.D. and Morris, M.A. (2009) The role of etched silicon channels on the pore ordering of mesoporous silica: The importance of film thickness on providing highly orientated and defect-free thin films. Applied Surface Science, 255 (23). pp. 9333-9342. ISSN 0169 4332. (doi:https://doi.org/10.1016/j.apsusc.2009.07.031) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) |