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The role of etched silicon channels on the pore ordering of mesoporous silica: The importance of film thickness on providing highly orientated and defect-free thin films

Arnold, Donna C., O'Callaghan, J.M., Sexton, A., Tobin, J.M., Amenitsch, H., Holmes, J.D., Morris, M.A. (2009) The role of etched silicon channels on the pore ordering of mesoporous silica: The importance of film thickness on providing highly orientated and defect-free thin films. Applied Surface Science, 255 (23). pp. 9333-9342. ISSN 0169 4332. (doi:10.1016/j.apsusc.2009.07.031) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided)

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Official URL
http://dx.doi.org/10.1016/j.apsusc.2009.07.031

Abstract

If mesoporous thin films (MTFs) are to be utilised in device applications it is important that we produce films which not only possess a single pore direction across large substrate areas (in the range of microns) but are also relatively defect free. In this paper we report the use of confining architectures in the form of topographically patterned rectangular section channels etched into native silicon substrates to promote ordering of the mesopores. We discuss the effects of the channels on films with different thicknesses. The film thickness is shown to be a critical parameter in defining highly orientated and defect-free films and the data demonstrate that it is possible to achieve a single mesoporous silica domain across macroscopic dimensions with thin film thicknesses of approximately 200 nm but that critically pore order can be lost in ultra thin and thicker films produced by these methods.

Item Type: Article
DOI/Identification number: 10.1016/j.apsusc.2009.07.031
Additional information: Unmapped bibliographic data: LA - English [Field not mapped to EPrints] J2 - Appl Surf Sci [Field not mapped to EPrints] AD - Materials and Supercritical Fluids Group, Department of Chemistry, the Tyndall National Institute, Cork, Ireland [Field not mapped to EPrints] AD - Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, 2, Ireland [Field not mapped to EPrints] AD - Institute of Biophysics and X-ray Structure Research, Austrian Academy of Sciences, Steyrergass 17/VI, 8010 Graz, Austria [Field not mapped to EPrints] DB - Scopus [Field not mapped to EPrints]
Uncontrolled keywords: Confining architectures, Mesoporous silica, SAXS, Thin films, XRR, Confining architectures, Critical parameter, Defect-free, Device application, Macroscopic dimensions, Meso-pores, Mesoporous silica, Mesoporous thin films, Pore ordering, Rectangular section, SAXS, Silicon channel, Silicon substrates, Ultra-thin, XRR, Architectural design, Defects, Film thickness, Magnetic films, Molecular beam epitaxy, Silica, Substrates, Thin films
Subjects: Q Science > QC Physics > QC176.8.N35 Nanoscience, nanotechnology
Divisions: Faculties > Sciences > School of Physical Sciences
Faculties > Sciences > School of Physical Sciences > Functional Materials Group
Depositing User: Giles Tarver
Date Deposited: 07 Jul 2015 11:06 UTC
Last Modified: 29 May 2019 14:43 UTC
Resource URI: https://kar.kent.ac.uk/id/eprint/49065 (The current URI for this page, for reference purposes)
Arnold, Donna C.: https://orcid.org/0000-0003-0239-5790
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