Restricting the high-temperature growth of nanocrystalline tin oxide

Chadwick, Alan V., Savin, Shelly L. P. (2003) Restricting the high-temperature growth of nanocrystalline tin oxide. Radiation Effects and Defects in Solids, 158 (1-6). pp. 73-76. ISSN 1042-0150. (doi:10.1080/1042015021000052520) (Access to this publication is currently restricted. You may be able to access a copy if URLs are provided) (KAR id:9392)

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Official URL: http://dx.doi.org/10.1080/1042015021000052520

Abstract

The sensitivity of tin oxide is dependent on various factors, one of which is the grain size. Three methods have been investigated with the aim of stabilising the grain size in the nanometer range, namely; (i) encapsulation within a silica matrix, (ii) coating the crystallites with hexamethyldisilazane and (iii) pinning the grain boundaries with a second metal oxide nanocrystal. The resulting materials have been characterised by X-ray powder diffraction (XRPD), Extended X-ray absorption fine structure (EXAFS) and conductivity measurements.

Item Type:	Article
DOI/Identification number:	10.1080/1042015021000052520
Uncontrolled keywords:	Nanocrystals, Tin Oxide, EXAFS, XRD
Subjects:	Q Science
Divisions:	Divisions > Division of Natural Sciences > Physics and Astronomy
Depositing User:	Alan Chadwick
Date Deposited:	15 Sep 2008 11:17 UTC
Last Modified:	05 Nov 2024 09:42 UTC
Resource URI:	https://kar.kent.ac.uk/id/eprint/9392 (The current URI for this page, for reference purposes)

University of Kent Author Information

Chadwick, Alan V..

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Savin, Shelly L. P..

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