Simulation and Measurement of the Lateral Spreading of Ions Implanted into Amorphous Targets

Oven, Robert, Ashworth, D.G., Hill, C. (1988) Simulation and Measurement of the Lateral Spreading of Ions Implanted into Amorphous Targets. In: Simulation of Semiconductor Devices & Processes. 3. pp. 429-440. (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:38932)

The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided.

Item Type:	Conference or workshop item (Paper)
Subjects:	T Technology
Divisions:	Divisions > Division of Computing, Engineering and Mathematical Sciences > School of Engineering and Digital Arts
Depositing User:	Tina Thompson
Date Deposited:	27 Mar 2014 15:38 UTC
Last Modified:	05 Nov 2024 10:23 UTC
Resource URI:	https://kar.kent.ac.uk/id/eprint/38932 (The current URI for this page, for reference purposes)

University of Kent Author Information

Oven, Robert.

Creator's ORCID:	https://orcid.org/0000-0002-8517-3634
CReDIT Contributor Roles:

Ashworth, D.G..

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