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Lateral variance of implanted ions

Ashworth, D.G., Oven, Robert, Bowyer, M.D.J. (1991) Lateral variance of implanted ions. Electronics Letters, 27 (16). pp. 1402-1403. ISSN 0013-5194. (doi:10.1049/el:19910880) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:38900)

The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided.
Official URL:
http://dx.doi.org/10.1049/el:19910880

Abstract

A quadratic model is presented whereby the depth-dependent lateral variance of ions implanted into amorphous targets may be estimated from a knowledge of the first seven moments of the distribution. The authors compare their results, and those derived using a perturbation approach of Lorenz et al., (1989) against high resolution Monte-Carlo data.

Item Type: Article
DOI/Identification number: 10.1049/el:19910880
Subjects: T Technology
Divisions: Divisions > Division of Computing, Engineering and Mathematical Sciences > School of Engineering and Digital Arts
Depositing User: Tina Thompson
Date Deposited: 25 Mar 2014 11:38 UTC
Last Modified: 16 Nov 2021 10:15 UTC
Resource URI: https://kar.kent.ac.uk/id/eprint/38900 (The current URI for this page, for reference purposes)

University of Kent Author Information

Ashworth, D.G..

Creator's ORCID:
CReDIT Contributor Roles:

Oven, Robert.

Creator's ORCID: https://orcid.org/0000-0002-8517-3634
CReDIT Contributor Roles:
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