Lateral variance of implanted ions

Ashworth, D.G., Oven, Robert, Bowyer, M.D.J. (1991) Lateral variance of implanted ions. Electronics Letters, 27 (16). pp. 1402-1403. ISSN 0013-5194. (doi:10.1049/el:19910880) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:38900)

The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided.
Official URL: http://dx.doi.org/10.1049/el:19910880

Abstract

A quadratic model is presented whereby the depth-dependent lateral variance of ions implanted into amorphous targets may be estimated from a knowledge of the first seven moments of the distribution. The authors compare their results, and those derived using a perturbation approach of Lorenz et al., (1989) against high resolution Monte-Carlo data.

Item Type:	Article
DOI/Identification number:	10.1049/el:19910880
Subjects:	T Technology
Divisions:	Divisions > Division of Computing, Engineering and Mathematical Sciences > School of Engineering and Digital Arts
Depositing User:	Tina Thompson
Date Deposited:	25 Mar 2014 11:38 UTC
Last Modified:	05 Nov 2024 10:23 UTC
Resource URI:	https://kar.kent.ac.uk/id/eprint/38900 (The current URI for this page, for reference purposes)

University of Kent Author Information

Ashworth, D.G..

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CReDIT Contributor Roles:

Oven, Robert.

Creator's ORCID:	https://orcid.org/0000-0002-8517-3634
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