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Simple-Model Of The Lithographic Response Of Hatzakis Chemically-Amplified Resists

Tate, P. C. Miller, Jones, R. G., Murphy, J., Everett, J. (1995) Simple-Model Of The Lithographic Response Of Hatzakis Chemically-Amplified Resists. Microelectronics Engineering, 27 (1-4). pp. 409-412. ISSN 0167-9317. (doi:10.1016/0167-9317(94)00135-H) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided)

The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided. (Contact us about this Publication)
Official URL
http://dx.doi.org/10.1016/0167-9317(94)00135-H

Abstract

A simple mathematical model has been employed to analyze quantitatively the crosslinking process in chemically amplified negative resists based on the combination of an epoxidized novolac resin and a photoacid generator. Experimental evaluation of a number of resists employing different resins has shown that sensitivity and contrast increase concomitantly. A resist formulation based on an experimental Dow resin designated DQ9 has demonstrated exceptional contrast and a sensitivity well matched to many e-beam systems.

Item Type: Article
DOI/Identification number: 10.1016/0167-9317(94)00135-H
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: Faculties > Sciences > School of Engineering and Digital Arts
Depositing User: I.T. Ekpo
Date Deposited: 25 Oct 2009 18:40 UTC
Last Modified: 04 Jun 2019 08:36 UTC
Resource URI: https://kar.kent.ac.uk/id/eprint/19085 (The current URI for this page, for reference purposes)
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