Tate, P. C. Miller, Jones, R. G., Murphy, J., Everett, J. (1995) Simple-Model Of The Lithographic Response Of Hatzakis Chemically-Amplified Resists. Microelectronics Engineering, 27 (1-4). pp. 409-412. ISSN 0167-9317. (doi:10.1016/0167-9317(94)00135-H) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:19085)
| The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided. | |
| Official URL: http://dx.doi.org/10.1016/0167-9317(94)00135-H |
Abstract
A simple mathematical model has been employed to analyze quantitatively the crosslinking process in chemically amplified negative resists based on the combination of an epoxidized novolac resin and a photoacid generator. Experimental evaluation of a number of resists employing different resins has shown that sensitivity and contrast increase concomitantly. A resist formulation based on an experimental Dow resin designated DQ9 has demonstrated exceptional contrast and a sensitivity well matched to many e-beam systems.
| Item Type: | Article |
|---|---|
| DOI/Identification number: | 10.1016/0167-9317(94)00135-H |
| Subjects: | T Technology > TK Electrical engineering. Electronics. Nuclear engineering |
| Divisions: | Divisions > Division of Computing, Engineering and Mathematical Sciences > School of Engineering and Digital Arts |
| Depositing User: | I.T. Ekpo |
| Date Deposited: | 25 Oct 2009 18:40 UTC |
| Last Modified: | 05 Nov 2024 09:55 UTC |
| Resource URI: | https://kar.kent.ac.uk/id/eprint/19085 (The current URI for this page, for reference purposes) |
- Export to:
- RefWorks
- EPrints3 XML
- BibTeX
- CSV
- Depositors only (login required):
Altmetric
Altmetric
