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Shallow angle x-ray diffraction from in-situ silica:titania sol-gel thin films

Rigden, Jane S., Newport, Robert J., Smith, Mark E., Dirken, P.J. (1995) Shallow angle x-ray diffraction from in-situ silica:titania sol-gel thin films. Materials Science Forum, 228 . pp. 525-530. ISSN 0255-5476. (doi:10.4028/www.scientific.net/MSF.228-231.525) (KAR id:15973)

Abstract

X-ray diffraction at shallow angles of incidence has been used to examine three silica:titania sol-gel thin films. Comparison with transmission x-ray diffraction measurements of similar materials in the bulk shows a distinct increase in disorder in the silica network. An increase in porosity of the network in thin films is also likely, suggested by an increase in Si-O-H bonds. No differences in structure between samples with differing titania contents were observed using this technique.

Item Type: Article
DOI/Identification number: 10.4028/www.scientific.net/MSF.228-231.525
Subjects: Q Science
Divisions: Faculties > Sciences > School of Physical Sciences > Functional Materials Group
Depositing User: J.M. Smith
Date Deposited: 29 Apr 2009 14:28 UTC
Last Modified: 05 Jun 2019 08:17 UTC
Resource URI: https://kar.kent.ac.uk/id/eprint/15973 (The current URI for this page, for reference purposes)
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