Honeybone, P.J.R., Walters, J.K., Huxley, D.W., Newport, Robert J., Howells, W.S., Tomkinson, John, Hotham, C. (1994) The Effect Of Hydrogen Dilution On The Interatomic Bonding Of Amorphous Hydrogenated Silicon - Carbon. Journal of Non-Crystalline Solids, 169 (1-2). pp. 54-63. ISSN 0022-3093. (doi:10.1016/0022-3093(94)90224-0) (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided) (KAR id:15910)
| The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided. | |
| Official URL: http://dx.doi.org/10.1016/0022-3093(94)90224-0 |
Abstract
The effect of hydrogen dilution of the precursor gas mixture on the local bonding environment in glow-discharge deposited a-Si:C:H has been studied by neutron diffraction and inelastic neutron scattering. The neutron diffraction results show a large increase in the silicon-carbon bonding upon hydrogen dilution, at the expense of silicon-silicon bonding. The inelastic neutron scattering provides complementary information on the hydrogen bonding environment. The hydrogen is predominantly bonded in SiH and SiH2 groups, with a large increase in the SiH2 group concentration occurring upon hydrogen dilution. The data presented here show that SiH3 and CH(n) groups are present as a very small fraction of H bonding sites, if at all.
| Item Type: | Article |
|---|---|
| DOI/Identification number: | 10.1016/0022-3093(94)90224-0 |
| Subjects: | Q Science |
| Divisions: | Divisions > Division of Natural Sciences > Physics and Astronomy |
| Depositing User: | J.M. Smith |
| Date Deposited: | 14 May 2009 12:34 UTC |
| Last Modified: | 05 Nov 2024 09:50 UTC |
| Resource URI: | https://kar.kent.ac.uk/id/eprint/15910 (The current URI for this page, for reference purposes) |
- Export to:
- RefWorks
- EPrints3 XML
- BibTeX
- CSV
- Depositors only (login required):
Altmetric
Altmetric
