The study of mechanical and statistical properties of nitrogen ion-implanted Tantalum bulk

In the present study, structural and mechanical properties of Tantalum samples which affected by nitrogen ion implantation have been investigated. The monofractal analysis of the samples has been carried out. These samples have been implanted with ions at different doses of 5 × 10^17 and 7 × 10^17 at energy 30 keV. For characterizing the samples, atomic force microscopy (AFM), EDX images analysis, and corrosion measurements, have been used. By varying the ion energy, the statistical characteristics will vary. In order to analyse the morphology of produced rough samples, the correlation function of samples have been studied and their correlation length is evaluated. Based on the statistical concept the power spectral density the height distribution, and the higher-order moments (skewness and kurtosis) of the surface height have been measured. These characteristics are the important criterions for the the monofractal evaluation. Our numerical calculations based on experimental data show the deviation from gaussian distribution. Also, the fractal dimension of the films has been calculated based on roughness exponent results. Indeed, irradiating the surfaces with energetic ions results in producing the self-affine fractal surfaces. This process via an erosion process affects the statistical characteristics which have been calculated for different samples. Because of variation in the morphology of rough samples, the corrosion of samples shows a non-uniform behaviuor.