Radiation chemical-yields and lithographic performance of electron-beam resists based on poly(methylstyrene-co-chlorostyrene)

Jones, Richard G. and Tate, Philip C. Miller and Brambley, David R. (1991) Radiation chemical-yields and lithographic performance of electron-beam resists based on poly(methylstyrene-co-chlorostyrene). Journal of Materials Chemistry, 1 (3). pp. 401-407. ISSN 0959-9428. (The full text of this publication is not currently available from this repository. You may be able to access a copy if URLs are provided)

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Copolymers of methylstyrene and chlorostyrene cross-link when irradiated with 20 keV electrons and hence act as negative-working electron-beam resists. o-Methylstyrene/p-chlorostyrene and p-methylstyrene/p-chlorostyrene copolymers have been prepared by a free-radical mechanism over the entire composition range and the lithographic performance of the materials has been evaluated. Radiation chemical yields for cross-linking and chain scission have also been estimated. None of the materials undergoes significant chain scission upon irradiation. In contrast to the corresponding methylstyrene/chloromethylstyrene copolymer systems, the resist sensitivities maximize at compositions containing ca. 30% chlorostyrene. A cross-linking mechanism involving an excited-state charge-transfer interaction of adjacent methylstyrene and chlorostyrene chain units is proposed. The copolymers of optimal composition display sufficiently high lithographic sensitivities and contrasts to commend their application as electron-beam resists.

Item Type: Article
Uncontrolled keywords: lithography; electron-beam resist; poly(methylstyrene-co-chlorostyrene); copolymer
Subjects: Q Science > QD Chemistry
Q Science > QC Physics
Divisions: Faculties > Science Technology and Medical Studies > School of Physical Sciences
Depositing User: O.O. Odanye
Date Deposited: 08 Oct 2009 20:12
Last Modified: 27 May 2014 14:15
Resource URI: https://kar.kent.ac.uk/id/eprint/22996 (The current URI for this page, for reference purposes)
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