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Number of items: 4.

Article

Jones, R.G. and Davies, R.D.P. and Brambley, D.R. (1993) Comparative-Evaluation Of Poly (Pentafluoroaryl Methacrylate)S And Their Nonfluorinated Analogs As Positive-Working Electron-Beam Resists. Journal of Materials Chemistry, 3 (1). pp. 15-18. ISSN 0959-9428. The full text of this publication is not available from this repository.

Jones, R.G. and Tate, P.C.M. and Brambley, D.R. (1993) Excited-state charge-transfer interactions in electron-beam resists based on styrene copolymers. Polymer, 34 (8). pp. 1768-1772. ISSN 0032-3861. The full text of this publication is not available from this repository.

Jones, R.G. and Cragg, R.H. and Davies, R.D.P. and Brambley, D.R. (1992) Comparison of the Electron-Beam Lithographic Properties of a Range of Poly (Methacrylates) and Their Silicon-Containing Analogs. Journal of Materials Chemistry, 2 (4). pp. 371-377. ISSN 0959-9428. The full text of this publication is not available from this repository.

Jones, R.G. and Tate, P.C.M. and Brambley, D.R. (1991) Radiation chemical-yields and lithographic performance of electron-beam resists based on poly(methylstyrene-co-chlorostyrene). Journal of Materials Chemistry, 1 (3). pp. 401-407. ISSN 0959-9428. The full text of this publication is not available from this repository.

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