Jones, R.G. and Tate, P.C.M. and Brambley, D.R. (1991) Radiation chemical-yields and lithographic performance of electron-beam resists based on poly(methylstyrene-co-chlorostyrene). Journal of Materials Chemistry, 1 (3). pp. 401-407. ISSN 0959-9428.
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Copolymers of methylstyrene and chlorostyrene cross-link when irradiated with 20 keV electrons and hence act as negative-working electron-beam resists. o-Methylstyrene/p-chlorostyrene and p-methylstyrene/p-chlorostyrene copolymers have been prepared by a free-radical mechanism over the entire composition range and the lithographic performance of the materials has been evaluated. Radiation chemical yields for cross-linking and chain scission have also been estimated. None of the materials undergoes significant chain scission upon irradiation. In contrast to the corresponding methylstyrene/chloromethylstyrene copolymer systems, the resist sensitivities maximize at compositions containing ca. 30% chlorostyrene. A cross-linking mechanism involving an excited-state charge-transfer interaction of adjacent methylstyrene and chlorostyrene chain units is proposed. The copolymers of optimal composition display sufficiently high lithographic sensitivities and contrasts to commend their application as electron-beam resists.
|Uncontrolled keywords:||lithography; electron-beam resist; poly(methylstyrene-co-chlorostyrene); copolymer|
|Subjects:||Q Science > QD Chemistry
Q Science > QC Physics
|Divisions:||Faculties > Science Technology and Medical Studies > School of Physical Sciences|
|Depositing User:||O.O. Odanye|
|Date Deposited:||08 Oct 2009 20:12|
|Last Modified:||08 Oct 2009 20:12|
|Resource URI:||http://kar.kent.ac.uk/id/eprint/22996 (The current URI for this page, for reference purposes)|
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