Deposition, evaluation and application of sputtered zinc oxide thin films

Wacogne, B. and Roe, M.P. and Pannell, C.N. (1995) Deposition, evaluation and application of sputtered zinc oxide thin films. International Journal of Optoelectronics, 10 (1). pp. 9-18. ISSN 0952-5432. (The full text of this publication is not available from this repository)

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Abstract

We discuss the production of oriented zinc oxide piezoelectric thin films grown by RF magnetron sputtering, and film evaluation techniques. In particular, we present a simple interferometric method for in situ and simultaneous measurement of film thickness and optical losses. We also show that due to plasma heating, the increase in substrate temperature at the beginning of the film growth leads to a varying film structure, causing a discrepancy between the expected and the observed resonant frequency of the films. We conclude this paper by presenting experimental results of acousto-optic interaction.

Item Type: Article
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK7800 Electronics (see also: telecommunications)
Divisions: Faculties > Science Technology and Medical Studies > School of Physical Sciences
Depositing User: I.T. Ekpo
Date Deposited: 25 Oct 2009 13:06
Last Modified: 25 Oct 2009 13:06
Resource URI: http://kar.kent.ac.uk/id/eprint/19112 (The current URI for this page, for reference purposes)
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