Simple-Model Of The Lithographic Response Of Hatzakis Chemically-Amplified Resists

Tate, P.C.M. and Jones, R.G. and Murphy, J. and Everett, J. (1995) Simple-Model Of The Lithographic Response Of Hatzakis Chemically-Amplified Resists. In: International Conference on Microfabrication and Nanofabrication, Sep 26-29, 1994, Davos, Switzerland. (The full text of this publication is not available from this repository)

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Official URL
http://dx.doi.org/10.1016/0167-9317(94)00135-H

Abstract

A simple mathematical model has been employed to analyze quantitatively the crosslinking process in chemically amplified negative resists based on the combination of an epoxidized novolac resin and a photoacid generator. Experimental evaluation of a number of resists employing different resins has shown that sensitivity and contrast increase concomitantly. A resist formulation based on an experimental Dow resin designated DQ9 has demonstrated exceptional contrast and a sensitivity well matched to many e-beam systems.

Item Type: Conference or workshop item (Paper)
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: Faculties > Science Technology and Medical Studies > School of Engineering and Digital Arts
Depositing User: I.T. Ekpo
Date Deposited: 25 Oct 2009 18:40
Last Modified: 25 Oct 2009 18:40
Resource URI: http://kar.kent.ac.uk/id/eprint/19085 (The current URI for this page, for reference purposes)
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