Electron beam resists based on oxirane functionalised polystyrenes

Murphy, J.J. and Jones, R.G. and Cordina, G. (1996) Electron beam resists based on oxirane functionalised polystyrenes. Microelectronic engineering , 35 (1-4). pp. 121-124. ISSN 0167-9317 . (The full text of this publication is not available from this repository)

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Abstract

Copolymers consisting of styrene and 4-ethenyl-phenyloxirane (epoxystyrene) can be synthesised by radical copolymerisation. The flexibility offered by this simple method of synthesis allows the production of a variety of copolymers. The possibility of altering the lithographic parameters by modification of the copolymer makes this method of production highly attractive for the purposes of lithographic optimisation. More so than for the analogous systems based upon epoxy novolak resins which suffer because a range of different polymers that, would allow a worthwhile structure/process optimisation, is not available.

Item Type: Article
Additional information: Conference Information: Micro and Nano Engineering Conference 1996 (MNE 96) UNIV Glasgow, Glasgow, Scotland, Sep 22-25, 1996 Univ Glasgow; Glasgow Dev Agcy; Oxford Instruments; Leica Cambridge Ltd; Elsevier; Greater Glasgow & Clyde Valley Tourist Board; City Glasgow; Motorola; IEEE LEOS Scott Chapter
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
T Technology
Divisions: Faculties > Science Technology and Medical Studies > School of Engineering and Digital Arts
Depositing User: M.A. Ziai
Date Deposited: 17 Apr 2009 17:41
Last Modified: 17 Apr 2009 17:41
Resource URI: http://kar.kent.ac.uk/id/eprint/18207 (The current URI for this page, for reference purposes)
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